MORPHOLOGY OF THERMALLY ETCHED GAAS SUBSTRATE AND MOLECULAR-BEAM EPITAXIAL LAYERS GROWN ON ITS SUBSTRATE

被引:5
作者
SAITO, J
NANBU, K
KONDO, K
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期
关键词
D O I
10.1116/1.584021
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:26 / 30
页数:5
相关论文
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