INSITU MEASUREMENT OF THE METALORGANIC AND HYDRIDE PARTIAL PRESSURES IN A MOCVD REACTOR USING ULTRAVIOLET-ABSORPTION SPECTROSCOPY

被引：39

作者：

HEBNER, GA

KILLEEN, KP

BIEFELD, RM

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1989年 / 98卷 / 03期

关键词：

D O I：

10.1016/0022-0248(89)90144-9

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

收藏

页码：293 / 301

页数：9

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