2-DIMENSIONAL-LIKE NUCLEATION OF GAAS ON SI BY ROOM-TEMPERATURE DEPOSITION

被引:22
作者
CASTAGNE, J
FONTAINE, C
BEDEL, E
MUNOZYAGUE, A
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D O I
10.1063/1.341668
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O59 [应用物理学];
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页码:2372 / 2374
页数:3
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共 8 条
[1]   SI-SUBSTRATE PREPARATION FOR GAAS/SI MOLECULAR-BEAM EPITAXY AT LOW-TEMPERATURE UNDER A SI FLUX [J].
CASTAGNE, J ;
BEDEL, E ;
FONTAINE, C ;
MUNOZYAGUE, A .
JOURNAL OF APPLIED PHYSICS, 1988, 64 (01) :246-248
[2]   EPITAXY BY PERIODIC ANNEALING [J].
CHO, AY .
SURFACE SCIENCE, 1969, 17 (02) :494-&
[3]  
FISCHER R, 1986, APPL PHYS LETT, V48, P1220
[4]  
GRUNTHANER FJ, 1987, MATER SCI REP, V1, P69
[5]   MEAN THICKNESS AT WHICH VAPOR-DEPOSITED THIN-FILMS REACH CONTINUITY [J].
KASHCHIEV, D .
THIN SOLID FILMS, 1978, 55 (03) :399-411
[6]   THE GROWTH OF GAAS ON SI BY MBE [J].
KOCH, SM ;
ROSNER, SJ ;
HULL, R ;
YOFFE, GW ;
HARRIS, JS .
JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) :205-213
[7]   EFFECTS OF VERY LOW GROWTH-RATES ON GAAS GROWN BY MOLECULAR-BEAM EPITAXY AT LOW SUBSTRATE TEMPERATURES [J].
METZE, GM ;
CALAWA, AR .
APPLIED PHYSICS LETTERS, 1983, 42 (09) :818-820
[8]   INITIAL GROWTH AND DISLOCATION ACCOMMODATION OF GAAS ON SI(100) BY MOLECULAR-BEAM EPITAXY [J].
TAKASUGI, H ;
KAWABE, M ;
BANDO, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (05) :L584-L586