A CURRENT INSTABILITY IN TIO2 THIN FILM

被引：14

作者：

HADA, T

HAYAKAWA, S

WASA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1970年 / 9卷 / 09期

关键词：

D O I：

10.1143/JJAP.9.1078

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1078 / +

页数：1

相关论文

共 6 条

[1] AN INVESTIGATION OF INSTABILITY AND CHARGE MOTION IN METAL-SILICON OXIDE-SILICON STRUCTURES
HOFSTEIN, SR
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (02) : 222 - +
[2] STRUCTURE AND ELECTRICAL PROPERTIES OF THIN OXIDE FILM DIODE WITH SPUTTERED TITANIUM BASE
IKUSHIMA, H
HAYAKAWA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1967, 6 (07) : 906 - &
[3] DEFECTS IN RUTILE .2. DIFFUSION OF INTERSTITIAL IONS
KINGSBURY, PI
OHLSEN, WD
JOHNSON, OW
[J]. PHYSICAL REVIEW, 1968, 175 (03): : 1099 - +
[4] ION TRANSPORT PHENOMENA IN INSULATING FILMS
SNOW, EH
GROVE, AS
DEAL, BE
SAH, CT
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (05) : 1664 - &
[5] REACTIVELY SPUTTERED TITANIUM RESISTORS CAPACITORS AND RECTIFIERS FOR MICROCIRCUITS
WASA, K
HAYAKAWA, S
[J]. MICROELECTRONICS RELIABILITY, 1967, 6 (03) : 213 - &
[6] LOW PRESSURE SPUTTERING SYSTEM OF MAGNETRON TYPE
WASA, K
HAYAKAWA, S
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (05) : 693 - &