SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASE EPITAXY-GROWN GAAS OBSERVED BY ATOMIC-FORCE MICROSCOPY

被引:19
作者
HSU, CC
WONG, TKS
WILSON, IH
机构
[1] Department of Electronic Engineering, The Chinese University of Hong Kong, Shatin, NT
关键词
D O I
10.1063/1.110679
中图分类号
O59 [应用物理学];
学科分类号
摘要
Steps of monolayer height (0.28 nm) are observed by atomic force microscope on a metalorganic vapor phase epitaxy grown GaAs surface. Monolayer terrace width was found to be as large as 430 nm, the same as the vicinal substrate surface. The growth mechanism is according to the classical Burton-Cabrera-Frank theory. We may have a larger (> 500 nm) terrace width and surface diffusion length if an exactly oriented [100] substrate is used.
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页码:1839 / 1841
页数:3
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