THE INFLUENCE OF PROCESSES ON COMPOSITION OF THERMALLY NITRIDED SIO2 FILM

被引：11

作者：

LIU, BY ^{[1
]}

CHENG, YC ^{[1
]}

LIU, ZH ^{[1
]}

机构：

[1] UNIV HONG KONG,DEPT ELECT & ELECTR ENGN,HONG KONG,HONG KONG

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 12期

关键词：

D O I：

10.1149/1.2095494

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3081 / 3086

页数：6

共 21 条

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