MICROHARDNESS AND STRUCTURE OF THICK SILICA FILMS PREPARED BY VACUUM DEPOSITION

被引：6

作者：

AIKAWA, K

SAKATA, H

FURUUCHI, S

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1978年 / 13卷 / 01期

关键词：

D O I：

10.1007/BF00739269

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：37 / 42

页数：6

共 12 条

[1]

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VACUUM, 1970, 20 (07) :293-&

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1385-&

[4] MICROHARDNESS OF SILICA FILMS PREPARED BY RESISTANCE HEATING AND ELECTRON-BEAM EVAPORATION [J].

FURUUCHI, S ;

SAKATA, H ;

AIKAWA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1974, 13 (11) :1905-1906

[5] OPTICAL PROPERTIES OF SILICON MONOXIDE IN THE WAVELENGTH REGION FROM 0.24 TO 14.0 MICRONS [J].

HASS, G ;

SALZBERG, CD .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1954, 44 (03) :181-187

[6] PREPARATION, STRUCTURE, AND APPLICATIONS OF THIN FILMS OF SILICON MONOXIDE AND TITANIUM DIOXIDE [J].

HASS, G .

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1950, 33 (12) :353-360

[7]

KAWAZU A, 1969, SCI PAP I PHYS CHEM, V3, P63

[8] VICKERS TYPE ULTRA-MICROHARDNESS TESTER FOR THIN-FILMS [J].

NISHIBORI, M ;

KINOSITA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1972, 11 (05) :758-+

[9]

PALATNIK LS, 1964, IND LAB, V30, P1355

[10] STRUCTURAL EVALUATION OF SILICON OXIDE FILMS [J].

PLISKIN, WA ;

LEHMAN, HS .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (10) :1013-&

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