DOPING OF RF-SPUTTERED A-SIGE-H ALLOYS

被引：2

作者：

BANERJEE, PK

PEREIRA, JMT

HANIDU, GA

MITRA, SS

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1988年 / 104卷 / 2-3期

关键词：

D O I：

10.1016/0022-3093(88)90387-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：190 / 194

页数：5

共 19 条

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