DENSITY AND DEPOSITION RATES OF AMORPHOUS CVD-SI3N4 INCLUDING CARBON

被引：14

作者：

HIRAI, T

GOTO, T

机构：

来源：

JOURNAL OF MATERIALS SCIENCE | 1981年 / 16卷 / 10期

关键词：

D O I：

10.1007/BF02402853

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2877 / 2882

页数：6

共 9 条

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