FINITE INTERFACE EFFECTS FOR THIN GAINAS/INP QUANTUM-WELLS GROWN BY LP-MOVPE WITH A GROWTH INTERRUPTION SEQUENCE

被引:40
作者
CAMASSEL, J [1 ]
LAURENTI, JP [1 ]
JUILLAGUET, S [1 ]
REINHARDT, F [1 ]
WOLTER, K [1 ]
KURZ, H [1 ]
GRUTZMACHER, D [1 ]
机构
[1] RHEIN WESTFAL TH AACHEN,INST SEMICOND ELECTR,W-5100 AACHEN,GERMANY
关键词
D O I
10.1016/0022-0248(91)90518-A
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
A prerequisite for growing quantum wells at the industrial level is to control the interface roughness. This is a dominant problem for very thin films and, in this respect, growth interruption sequences have been proposed. In this work, we investigate the interface layers, produced between two InP barriers, by a growth interruption sequence of 8 s: 6 s are under phosphine and 4 s under arsine. We find the resulting build-up of ultrathin (approximately-2 MLs thick) layers of InAsP, strained between the two limiting barriers.
引用
收藏
页码:543 / 548
页数:6
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