SURFACES OF VACUUM-DEPOSITED SILICON-OXIDE FILMS STUDIED BY AUGER-ELECTRON SPECTROSCOPY

被引：9

作者：

MAKI, K

SHIGETA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 06期

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D O I：

10.1143/JJAP.20.1047

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1047 / 1053

页数：7

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