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INFLUENCE OF ATOMIC-HYDROGEN ON THE GROWTH REACTIONS OF AMORPHOUS BORON FILMS IN A LOW-PRESSURE B2H6+HE+H2 PLASMA
被引:25
作者
:
KOMATSU, S
论文数:
0
引用数:
0
h-index:
0
KOMATSU, S
MORIYOSHI, Y
论文数:
0
引用数:
0
h-index:
0
MORIYOSHI, Y
机构
:
来源
:
JOURNAL OF APPLIED PHYSICS
|
1988年
/ 64卷
/ 04期
关键词
:
D O I
:
10.1063/1.341738
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:1878 / 1884
页数:7
相关论文
共 20 条
[1]
MASS SPECTROMETRIC INVESTIGATION OF PYROLYSIS OF BORANES .4. DIBORANE
[J].
BAYLIS, AB
论文数:
0
引用数:
0
h-index:
0
BAYLIS, AB
;
PRESSLEY, GA
论文数:
0
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0
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0
PRESSLEY, GA
;
STAFFORD, FE
论文数:
0
引用数:
0
h-index:
0
STAFFORD, FE
.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1966,
88
(11)
:2428
-&
[2]
RATE-DETERMINING REACTIONS AND SURFACE SPECIES IN CVD OF SILICON .1. THE SIH4-HCL-H2 SYSTEM
[J].
BLOEM, J
论文数:
0
引用数:
0
h-index:
0
BLOEM, J
;
CLAASSEN, WAP
论文数:
0
引用数:
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CLAASSEN, WAP
.
JOURNAL OF CRYSTAL GROWTH,
1980,
49
(03)
:435
-444
[3]
ANALYSIS OF ION-MOLECULE REACTIONS IN GASEOUS H2, D2, AND HD BY ION CYCLOTRON RESONANCE TECHNIQUES
[J].
BOWERS, MT
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Chemistry, University of California, Santa Barbara
BOWERS, MT
;
ELLEMAN, DD
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Chemistry, University of California, Santa Barbara
ELLEMAN, DD
;
KING, J
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Chemistry, University of California, Santa Barbara
KING, J
.
JOURNAL OF CHEMICAL PHYSICS,
1969,
50
(11)
:4787
-+
[4]
BORON COMPOUND PROTECTIVE COATINGS PREPARED BY MEANS OF LOW-PRESSURE PLASMA CVD
[J].
BRAGANZA, C
论文数:
0
引用数:
0
h-index:
0
机构:
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
BRAGANZA, C
;
VEPREK, S
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FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
VEPREK, S
;
GRONER, P
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引用数:
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FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
GRONER, P
.
JOURNAL OF NUCLEAR MATERIALS,
1979,
85-6
(DEC)
:1133
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[5]
MECHANISM OF SI POLYCRYSTALLINE GROWTH ON A SI3N4 SUBSTRATE FROM SIH4/H2 AT REDUCED PRESSURES
[J].
CADORET, R
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0
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LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
CADORET, R
;
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LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
HOTTIER, F
.
JOURNAL OF CRYSTAL GROWTH,
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64
(03)
:583
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[6]
MECHANISMS OF SILICON MONOCRYSTALLINE GROWTH FROM SIH4/H-2 AT REDUCED PRESSURES
[J].
CADORET, R
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0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
CADORET, R
;
HOTTIER, F
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h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
HOTTIER, F
.
JOURNAL OF CRYSTAL GROWTH,
1983,
61
(02)
:259
-274
[7]
THE DEPOSITION OF SILICON FROM SILANE IN A LOW-PRESSURE HOT-WALL SYSTEM
[J].
CLAASSEN, WAP
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0
引用数:
0
h-index:
0
CLAASSEN, WAP
;
BLOEM, J
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0
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0
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BLOEM, J
;
VALKENBURG, WGJN
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;
VANDENBREKEL, CHJ
论文数:
0
引用数:
0
h-index:
0
VANDENBREKEL, CHJ
.
JOURNAL OF CRYSTAL GROWTH,
1982,
57
(02)
:259
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[8]
ION-ASSISTED AND ELECTRON-ASSISTED GAS-SURFACE CHEMISTRY - IMPORTANT EFFECT IN PLASMA-ETCHING
[J].
COBURN, JW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
COBURN, JW
;
WINTERS, HF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
WINTERS, HF
.
JOURNAL OF APPLIED PHYSICS,
1979,
50
(05)
:3189
-3196
[9]
EVERSTEYN FC, 1974, PHILIPS RES REP, V29, P45
[10]
DIRECT DETECTION OF BORANE MOLECULE + BORYL RADICAL BY MASS SPECTROMETRY
[J].
FEHLNER, TP
论文数:
0
引用数:
0
h-index:
0
FEHLNER, TP
;
KOSKI, WS
论文数:
0
引用数:
0
h-index:
0
KOSKI, WS
.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1964,
86
(13)
:2733
-&
←
1
2
→
共 20 条
[1]
MASS SPECTROMETRIC INVESTIGATION OF PYROLYSIS OF BORANES .4. DIBORANE
[J].
BAYLIS, AB
论文数:
0
引用数:
0
h-index:
0
BAYLIS, AB
;
PRESSLEY, GA
论文数:
0
引用数:
0
h-index:
0
PRESSLEY, GA
;
STAFFORD, FE
论文数:
0
引用数:
0
h-index:
0
STAFFORD, FE
.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1966,
88
(11)
:2428
-&
[2]
RATE-DETERMINING REACTIONS AND SURFACE SPECIES IN CVD OF SILICON .1. THE SIH4-HCL-H2 SYSTEM
[J].
BLOEM, J
论文数:
0
引用数:
0
h-index:
0
BLOEM, J
;
CLAASSEN, WAP
论文数:
0
引用数:
0
h-index:
0
CLAASSEN, WAP
.
JOURNAL OF CRYSTAL GROWTH,
1980,
49
(03)
:435
-444
[3]
ANALYSIS OF ION-MOLECULE REACTIONS IN GASEOUS H2, D2, AND HD BY ION CYCLOTRON RESONANCE TECHNIQUES
[J].
BOWERS, MT
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Chemistry, University of California, Santa Barbara
BOWERS, MT
;
ELLEMAN, DD
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Chemistry, University of California, Santa Barbara
ELLEMAN, DD
;
KING, J
论文数:
0
引用数:
0
h-index:
0
机构:
Department of Chemistry, University of California, Santa Barbara
KING, J
.
JOURNAL OF CHEMICAL PHYSICS,
1969,
50
(11)
:4787
-+
[4]
BORON COMPOUND PROTECTIVE COATINGS PREPARED BY MEANS OF LOW-PRESSURE PLASMA CVD
[J].
BRAGANZA, C
论文数:
0
引用数:
0
h-index:
0
机构:
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
BRAGANZA, C
;
VEPREK, S
论文数:
0
引用数:
0
h-index:
0
机构:
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
VEPREK, S
;
GRONER, P
论文数:
0
引用数:
0
h-index:
0
机构:
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
FED INST REACTOR RES,CH-5303 WURENLINGEN,SWITZERLAND
GRONER, P
.
JOURNAL OF NUCLEAR MATERIALS,
1979,
85-6
(DEC)
:1133
-1137
[5]
MECHANISM OF SI POLYCRYSTALLINE GROWTH ON A SI3N4 SUBSTRATE FROM SIH4/H2 AT REDUCED PRESSURES
[J].
CADORET, R
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
CADORET, R
;
HOTTIER, F
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
HOTTIER, F
.
JOURNAL OF CRYSTAL GROWTH,
1983,
64
(03)
:583
-592
[6]
MECHANISMS OF SILICON MONOCRYSTALLINE GROWTH FROM SIH4/H-2 AT REDUCED PRESSURES
[J].
CADORET, R
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
CADORET, R
;
HOTTIER, F
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
HOTTIER, F
.
JOURNAL OF CRYSTAL GROWTH,
1983,
61
(02)
:259
-274
[7]
THE DEPOSITION OF SILICON FROM SILANE IN A LOW-PRESSURE HOT-WALL SYSTEM
[J].
CLAASSEN, WAP
论文数:
0
引用数:
0
h-index:
0
CLAASSEN, WAP
;
BLOEM, J
论文数:
0
引用数:
0
h-index:
0
BLOEM, J
;
VALKENBURG, WGJN
论文数:
0
引用数:
0
h-index:
0
VALKENBURG, WGJN
;
VANDENBREKEL, CHJ
论文数:
0
引用数:
0
h-index:
0
VANDENBREKEL, CHJ
.
JOURNAL OF CRYSTAL GROWTH,
1982,
57
(02)
:259
-266
[8]
ION-ASSISTED AND ELECTRON-ASSISTED GAS-SURFACE CHEMISTRY - IMPORTANT EFFECT IN PLASMA-ETCHING
[J].
COBURN, JW
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
COBURN, JW
;
WINTERS, HF
论文数:
0
引用数:
0
h-index:
0
机构:
IBM Research Laboratory, San Jose
WINTERS, HF
.
JOURNAL OF APPLIED PHYSICS,
1979,
50
(05)
:3189
-3196
[9]
EVERSTEYN FC, 1974, PHILIPS RES REP, V29, P45
[10]
DIRECT DETECTION OF BORANE MOLECULE + BORYL RADICAL BY MASS SPECTROMETRY
[J].
FEHLNER, TP
论文数:
0
引用数:
0
h-index:
0
FEHLNER, TP
;
KOSKI, WS
论文数:
0
引用数:
0
h-index:
0
KOSKI, WS
.
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1964,
86
(13)
:2733
-&
←
1
2
→