VISIBLE LUMINESCENCE FROM SILICON-WAFERS SUBJECTED TO STAIN ETCHES

被引:214
作者
FATHAUER, RW
GEORGE, T
KSENDZOV, A
VASQUEZ, RP
机构
[1] Center for Space Microelectronics Technology, Jet Propulsion Laboratory, California Institute of Technology, Pasadena
关键词
D O I
10.1063/1.106485
中图分类号
O59 [应用物理学];
学科分类号
摘要
Etching of Si in a variety of solutions is known to cause staining. These stain layers consist of porous material similar to that produced by anodic etching of Si in HF solutions. We have observed photoluminescence peaked in the red from stain-etched Si wafers of different dopant types, concentrations, and orientations produced in solutions of HF:HNO3:H2O. Luminescence is also observed in stain films produced in solutions of NaNO2 in HF, but not in stain films produced in solutions of CrO3 in HF. The luminescence spectra are similar to those reported recently for porous Si films produced by anodic etching in HF solutions. However, stain films are much easier to produce, requiring no special equipment.
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页码:995 / 997
页数:3
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