HIGH-GAIN INGAALAS/INGAAS HETEROJUNCTION BIPOLAR-TRANSISTORS AND PHOTOTRANSISTORS

被引:11
作者
DODABALAPUR, A
CHANG, TY
机构
[1] AT&T Bell Laboratories, Holmdel
关键词
D O I
10.1109/55.116958
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The characteristics of InGaAlAs/InGaAs heterojunction bipolar transistors (HBT's) grown by molecular beam epitaxy are described. A current gain of 15 600 at a current density of approximately 10(4) A/cm2 and an emitter-base heterojunction ideality factor of 1.02 are measured. Appropriately designed InGaAlAs/InGaAs HBT's, when operated as phototransistors, also have high gains. A current gain of 1000 for a collector current of only 10-mu-A is obtained for phototransistors. Such high gains are due to low recombination currents as a consequence of the good crystalline quality of the InGaAlAs bulk and InGaAlAs/InGaAs interface.
引用
收藏
页码:693 / 695
页数:3
相关论文
共 9 条
[1]  
Campbell J., 1985, SEMICONDUCTORS SEMIM, V22
[2]   OPTICALLY CONTROLLED SURFACE-EMITTING LASERS [J].
CHAN, WK ;
HARBISON, JP ;
VONLEHMEN, AC ;
FLOREZ, LT ;
NGUYEN, CK ;
SCHWARZ, SA .
APPLIED PHYSICS LETTERS, 1991, 58 (21) :2342-2344
[3]   AN INP INGAAS P-I-N HBT MONOLITHIC TRANSIMPEDANCE PHOTORECEIVER [J].
CHANDRASEKHAR, S ;
JOHNSON, BC ;
BONNEMASON, M ;
TOKUMITSU, E ;
GNAUCK, AH ;
DENTAI, AG ;
JOYNER, CH ;
PERINO, JS ;
QUA, GJ ;
MONBERG, EM .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1990, 2 (07) :505-506
[4]   SUBPICOSECOND INP/INGAAS HETEROSTRUCTURE BIPOLAR-TRANSISTORS [J].
CHEN, YK ;
NOTTENBURG, RN ;
PANISH, MB ;
HAMM, RA ;
HUMPHREY, DA .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (06) :267-269
[5]   HIGH-FREQUENCY SUBMICROMETER AL0.48IN0.52AS/IN0.53GA0.47AS HETEROSTRUCTURE BIPOLAR-TRANSISTORS [J].
JALALI, B ;
NOTTENBURG, RN ;
CHEN, YK ;
SIVCO, D ;
HUMPHREY, DA ;
CHO, AY .
IEEE ELECTRON DEVICE LETTERS, 1989, 10 (08) :391-393
[6]  
KIM ME, 1991, HEMTS HBTS
[7]  
Leu L. Y., 1990, International Electron Devices Meeting 1990. Technical Digest (Cat. No.90CH2865-4), P149, DOI 10.1109/IEDM.1990.237205
[8]   ULTRA-HIGH CURRENT GAIN INGAASP INP HETEROJUNCTION BIPOLAR-TRANSISTOR [J].
OHISHI, T ;
ABE, Y ;
SUGIMOTO, H ;
OHTSUKA, K ;
MATSUI, T .
ELECTRONICS LETTERS, 1990, 26 (06) :392-393
[9]   A HIGH-PERFORMANCE INGAAS/INALAS DOUBLE-HETEROJUNCTION BIPOLAR-TRANSISTOR WITH NONALLOYED N+-INAS CAP LAYER ON INP(N) GROWN BY MOLECULAR-BEAM EPITAXY [J].
PENG, CK ;
WON, T ;
LITTON, CW ;
MORKOC, H .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (07) :331-333