SIMULTANEOUS MONITORING OF DIFFERENT SURFACE PROCESSES ON DIFFERENT STREAKS OF THE REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION PATTERN

被引:3
作者
BRAUN, W [1 ]
PLOOG, K [1 ]
机构
[1] MAX PLANCK INST FESTKORPERFORSCH,D-70569 STUTTGART,GERMANY
关键词
D O I
10.1016/0022-0248(94)00706-3
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The recently discovered additional phase shift of reflection high energy electron diffraction (RHEED) intensity oscillations at heterointerfaces significantly deepens the analysis of surface dynamics using RHEED. The evolution of the phase shift is different for the (01) and (00) streaks of the same RHEED pattern because the two streaks show a different sensitivity on surface morphology: whereas diffraction into (01) streaks requires good lateral periodicity of the surface, no lateral periodicity is required for diffraction into the (00) streak. Therefore, the signal on the (00) streak should be most sensitive towards steps running along the electron beam, while the (01) beams sample mostly terraces. We demonstrate the potential and sensitivity of this effect using GaAs-AlAs(100) interfaces and discuss its compatibility with current models of RHEED oscillations. The effects is then applied to characterize the incorporation dynamics of segregating and non-segregating dopants.
引用
收藏
页码:62 / 67
页数:6
相关论文
共 15 条
[1]   SURFACE RECONSTRUCTIONS OF GAAS(100) OBSERVED BY SCANNING TUNNELING MICROSCOPY [J].
BIEGELSEN, DK ;
BRINGANS, RD ;
NORTHRUP, JE ;
SWARTZ, LE .
PHYSICAL REVIEW B, 1990, 41 (09) :5701-5706
[2]   IN-SITU TECHNIQUE FOR MEASURING GA SEGREGATION AND INTERFACE ROUGHNESS AT GAAS/ALGAAS INTERFACES [J].
BRAUN, W ;
PLOOG, KH .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (04) :1993-2001
[3]   SURFACE STOICHIOMETRY AND MORPHOLOGY OF MBE GROWN (001)GAAS THROUGH THE ANALYSIS OF RHEED OSCILLATIONS [J].
BRIONES, F ;
GOLMAYO, D ;
GONZALEZ, L ;
DEMIGUEL, JL .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1985, 24 (06) :L478-L480
[4]   SELF-ORGANIZED INPLANE INCORPORATION OF SI ATOMS IN GAAS BY MOLECULAR-BEAM EPITAXY [J].
DAWERITZ, L ;
KOSTIAL, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1994, 58 (01) :81-86
[5]   REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION CHARACTERISTIC ABSENCES IN GAAS(100) (2X4)-AS - A TOOL FOR DETERMINING THE SURFACE STOICHIOMETRY [J].
FARRELL, HH ;
PALMSTROM, CJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (04) :903-907
[6]   SI MIGRATION EFFECTS IN GAAS/(AL,GA)AS HETEROJUNCTION AND DELTA-DOPED STRUCTURES [J].
HARRIS, JJ ;
BEALL, RB ;
CLEGG, JB ;
FOXON, CT ;
BATTERSBY, SJ ;
LACKLISON, DE ;
DUGGAN, G ;
HELLON, CM .
JOURNAL OF CRYSTAL GROWTH, 1989, 95 (1-4) :257-259
[7]   DYNAMICAL DIFFRACTION EFFECT FOR RHEED INTENSITY OSCILLATIONS - PHASE-SHIFT OF OSCILLATIONS FOR GLANCING ANGLES [J].
HORIO, Y ;
ICHIMIYA, A .
SURFACE SCIENCE, 1993, 298 (2-3) :261-272
[8]   THE APPLICATION OF RHEED INTENSITY EFFECTS TO INTERRUPTED GROWTH AND INTERFACE FORMATION DURING MBE GROWTH OF GAAS/(AL, GA)AS STRUCTURES [J].
JOYCE, BA ;
ZHANG, J ;
NEAVE, JH ;
DOBSON, PJ .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 45 (03) :255-260
[9]   EXPERIMENTAL-EVIDENCE OF DIFFERENCE IN SURFACE AND BULK COMPOSITIONS OF ALXGA1-XAS, ALXIN1-XAS AND GAXIN1-XAS EPITAXIAL LAYERS GROWN BY MOLECULAR-BEAM EPITAXY [J].
MASSIES, J ;
TURCO, F ;
SALETES, A ;
CONTOUR, JP .
JOURNAL OF CRYSTAL GROWTH, 1987, 80 (02) :307-314
[10]   INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE MORPHOLOGY OF ALXGA1-XAS GROWN BY MOLECULAR-BEAM EPITAXY [J].
MORKOC, H ;
DRUMMOND, TJ ;
KOPP, W ;
FISCHER, R .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (04) :824-826