CHEMICAL VAPOR-DEPOSITION OF PHOSPHOSILICATE GLASSES FROM MIXTURES OF SIH4, O2, AND POCI3

被引：7

作者：

GHEZZO, M

机构：

来源：

关键词：

D O I：

10.1149/1.2404012

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1428 / &

共 8 条

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[4] RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].

IRVIN, JC .

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[5] USE OF HCI GETTERING IN SILICON DEVICE PROCESSING [J].

ROBINSON, PH ;

HEIMAN, FP .

[6]

STULL DR, 1947, IND ENG CHEM, V39, P540

[7]

TENNEY AS, TO BE PUBLISHED

WONG, J ;

GHEZZO, M .