DEFECTS IN HARD COATINGS STUDIED BY POSITRON-ANNIHILATION SPECTROSCOPY AND X-RAY-DIFFRACTION

被引：35

作者：

SCHAFFER, JP

PERRY, AJ

BRUNNER, J

机构：

[1] VAC TEC SYST INC,BOULDER,CO 80301

[2] ETH,FESTKORPERPHYS LAB,CH-8093 ZURICH,SWITZERLAND

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.578136

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

TiNx (0.5 < x < 1.1 ) thin films, grown on stainless steel substrates via reactive sputtering, have been studied using positron annihilation spectroscopy and x-ray diffraction techniques. The deposition parameters investigated include nitrogen partial pressure, deposition power, substrate bias, film thickness, and substrate condition. The synergistic effects of using multiple techniques to characterize the same or similar samples is emphasized.

引用

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页码：193 / 207

页数：15

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