A COMPUTER-SIMULATION OF THE RECOMBINATION PROCESS AT COMPOUND SEMICONDUCTOR SURFACES AND HETERO-INTERFACES

被引:20
作者
SAITOH, T
HASEGAWA, H
KONISHI, S
OHNO, H
机构
[1] Department of Electrical Engineering, Faculty of Engineering, Hokkaido University, Sapporo
关键词
D O I
10.1016/0169-4332(89)90091-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The complex recombination process through quantum states at compound semiconductor surfaces and hetero-interfaces is analyzed in a unified manner on the computer, using the unified disorder induced gap state (DIGS) model. Recombination through uniformly distributed states at surfaces and hetero-interfaces, and that through U-shaped surface states at GaAs surfaces subjected to various surface treatments, are specifically analyzed. The result indicates that the effective surface recombination velocity is not constant, but is strongly dependent on the excitation intensity and the location of charge neutrality level, EHO. PL intensity enhancement after photochemical oxidation in water and sulfur treatments (Na2S, (NH4)2S) is shown to be not due to reduction of the durface states, but due to the generation of a fixed charge, whereas photochemical HCl treatment reduces the surface states significantly. © 1989.
引用
收藏
页码:402 / 406
页数:5
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