AUGER-ELECTRON SPECTROSCOPY AND RUTHERFORD BACKSCATTERING SPECTROSCOPY STUDIES OF TIN AND TIC COATINGS PREPARED BY THE ACTIVATED REACTIVE EVAPORATION PROCESS

被引：10

作者：

KAUFHERR, N ^{[1
]}

FENSKE, GR ^{[1
]}

BUSCH, DE ^{[1
]}

LIN, P ^{[1
]}

DESHPANDEY, C ^{[1
]}

BUNSHAH, RF ^{[1
]}

机构：

[1] UNIV CALIF LOS ANGELES,LOS ANGELES,CA 90024

来源：

THIN SOLID FILMS | 1987年 / 153卷

关键词：

This work is supported by the Tribology Program; U.S. Department of Energy; Energy Conversion and Utilization Technologies Division; under Contract W-31-109-ENG-38. We are grateful to Dr. J. E. Sundgren; Linkoping; Sweden; for the single-crystal TiN; to Mr. C. B. Finch of Oak Ridge National Laboratory for the single-crystal TIC; to E. M. Stefanski for a very thorough and helpful editing of the manuscript and to Lee Northcutt for patiently typing all versions.This paper has been authored by a contractor of the U.S. Government under contract No. W-31-109-ENG-38. Accordingly; the U.S. Government retains a nonexclusive; royalty-free license to publish or reproduce the published form of this contribution; or allow others to do so; for U.S. Government purposes;

D O I：

10.1016/0040-6090(87)90178-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：149 / 157

页数：9

共 16 条

[1] A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS [J].

BURROW, BJ ;

MORGAN, AE ;

ELLWANGER, RC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2463-2469

[2]

Chu W. K., 1978, BACKSCATTERING SPECT

[3] QUANTITATIVE AUGER-ELECTRON ANALYSIS OF TITANIUM NITRIDES [J].

DAWSON, PT ;

TZATZOV, KK .

SURFACE SCIENCE, 1985, 149 (01) :105-118

[4]

DESHPANDEY C, IN PRESS J VAC SCI T

[5] CHARACTERIZATION OF HARD NITRIDE AND CARBIDE TITANIUM AND ZIRCONIUM COATINGS ON HIGH-SPEED STEEL CUTTING-TOOL INSERTS [J].

FENSKE, G ;

KAUFHERR, N ;

ALBERTSON, C ;

MAPALO, G ;

NIELSEN, R ;

KAMINSKY, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2879-2884

[6] MATERIAL SELECTION FOR HARD COATINGS [J].

HOLLECK, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2661-2669

[7]

KAUFHERR N, IN PRESS J VAC SCI T

[8] ON STRUCTURE AND PROPERTIES OF SPUTTERED TI AND AL BASED HARD COMPOUND FILMS [J].

KNOTEK, O ;

BOHMER, M ;

LEYENDECKER, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2695-2700

[9] CHARACTERISTICS OF DC MAGNETRON, REACTIVELY SPUTTERED TINX FILMS FOR DIFFUSION-BARRIERS IN III-V SEMICONDUCTOR METALLIZATION [J].

NOEL, JP ;

HOUGHTON, DC ;

ESTE, G ;

SHEPHERD, FR ;

PLATTNER, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02) :284-287

[10] THE CHEMICAL-ANALYSIS OF TIN FILMS - A ROUND-ROBIN EXPERIMENT [J].

PERRY, AJ ;

STRANDBERG, C ;

SPROUL, WD ;

HOFMANN, S ;

ERNSBERGER, C ;

NICKERSON, J ;

CHOLLET, L .

THIN SOLID FILMS, 1987, 153 :169-183

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