METHOD OF OPTIMIZING REGISTRATION SIGNALS FOR ELECTRON-BEAM MICROFABRICATION

被引：14

作者：

STICKEL, W

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期

关键词：

Compendex;

D O I：

10.1116/1.569624

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

ELECTRON BEAMS

引用

页码：901 / 905

页数：5

共 9 条

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HERRIOTT, DR
COLLIER, RJ
ALLES, DS
STAFFORD, JW
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392
[5] COMPUTER-CONTROLLED ELECTRON-BEAM MICROFABRICATION MACHINE WITH A NEW REGISTRATION SYSTEM
SAITOU, N
MUNAKATA, C
MIURA, Y
HONDA, Y
[J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1974, 7 (06): : 441 - 444
[6] VARNELL GL, 1973, IEEE INTERCON TECH D, P1
[7] EXPERIMENTAL SCANNING ELECTRON-BEAM AUTOMATIC REGISTRATION SYSTEM
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CHANG, THP
KERN, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1240 - 1245
[8] COMPOSITION AND DETECTION OF ALIGNMENT MARKS FOR ELECTRON-BEAM LITHOGRAPHY
WOLF, ED
COANE, PJ
OZDEMIR, FS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1266 - 1270
[9] YOURKE HS, 1976, TECH DIGEST IEDM, P431