CONTROL OF FLUOROCARBON RADICALS BY ON-OFF MODULATED ELECTRON-CYCLOTRON-RESONANCE PLASMA

被引：49

作者：

TAKAHASHI, K

HORI, M

GOTO, T

机构：

[1] Department of Quantum Engineering, School of Engineering, Nagoya University, Chikusa-ku Nagoya, 464-01, Furo-cho

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1993年 / 32卷 / 8A期

关键词：

ELECTRON CYCLOTRON RESONANCE PLASMA; INFRARED DIODE LASER ABSORPTION SPECTROSCOPY; CHF3; CF; CF2; CF3; RADICAL DENSITY; ON-OFF MODULATED PLASMA; FLUOROCARBON FILM;

D O I：

10.1143/JJAP.32.L1088

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The CF, CF2 and CF3 radical densities were investigated using infrared diode laser absorption spectroscopy (IRLAS) in a CHF3 electron cyclotron resonance (ECR) plasma with varying on-off period of the microwave source, as well as continuous wave (CW). The ratio of CF and CF2 radical densities to CF3 radical density was successfully controlled through variation of the duty cycle in a constant pulse width, together with the deposition rate of fluorocarbon films. Furthermore, the radical densities were discussed in comparison with intensities of emission lines F*, Ar* and H(alpha).

引用

页码：L1088 / L1091

页数：4

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