NOVEL METHOD FOR MEASURING AND ANALYZING SURFACE-ROUGHNESS ON SEMICONDUCTOR-LASER ETCHED FACETS

被引：4

作者：

HERRICK, RW

SABO, LG

LEVY, JL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 06期

关键词：

D O I：

10.1116/1.585643

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We introduce a method of measuring the surface profile of etched facets on semiconductor lasers, giving direct, quantitative results. Unlike previous techniques which attempt to infer facet quality from electro-optic performance or subjective analysis of micrographs, this technique provides the actual facet profile. We show how this information can be used for process improvement, and accurate numerical simulation of facet reflectivity.

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页码：2778 / 2783

页数：6

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