PREPARATION OF AMORPHOUS-SILICON FILMS BY CHEMICAL VAPOR-DEPOSITION FROM HIGHER SILANES SINH2N+2(NGREATER-THAN1)

被引：45

作者：

GAU, SC

WEINBERGER, BR

AKHTAR, M

KISS, Z

MACDIARMID, AG

机构：

来源：

APPLIED PHYSICS LETTERS | 1981年 / 39卷 / 05期

关键词：

D O I：

10.1063/1.92765

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：436 / 438

页数：3

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