PHOTOREFLECTANCE MEASUREMENTS OF UNINTENTIONAL IMPURITY CONCENTRATIONS IN UNDOPED GAAS

被引：28

作者：

SYDOR, M

ANGELO, J

MITCHEL, W

HAAS, TW

YEN, MY

机构：

[1] USAF,WRIGHT AERONAUT LABS,MAT LAB,WRIGHT PATTERSON AFB,OH 45433

[2] SYSTRAN CORP,DAYTON,OH 45432

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 01期

关键词：

D O I：

10.1063/1.343896

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：156 / 160

页数：5

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