RECOIL IMPLANTATION OF ANTIMONY INTO SILICON

被引：30

作者：

GROB, A

GROB, JJ

MESLI, N

SALLES, D

SIFFERT, P

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS | 1981年 / 182卷 / APR期

关键词：

D O I：

10.1016/0029-554X(81)90674-1

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：85 / 92

页数：8

共 18 条

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[4]

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[7] TRANSMISSION SPUTTERING AND RECOIL IMPLANTATION FROM THIN METAL-FILMS UNDER ION-BOMBARDMENT [J].

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[8]

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[9]

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[10]

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