HIGH-TEMPERATURE SUPERCONDUCTING FILMS BY RF MAGNETRON SPUTTERING

被引：20

作者：

KADIN, AM ^{[1
]}

BALLENTINE, PH ^{[1
]}

ARGANA, J ^{[1
]}

RATH, RC ^{[1
]}

机构：

[1] CVC PROD INC,ROCHESTER,NY 14603

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1989年 / 25卷 / 02期

关键词：

D O I：

10.1109/20.92799

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2437 / 2440

页数：4

共 22 条

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[15] DIRECT PRODUCTION OF CRYSTALLINE SUPERCONDUCTING THIN-FILMS OF YBA2CU3O7 BY HIGH-PRESSURE OXYGEN SPUTTERING [J].

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[16]

Rossanagel S.M., 1988, AM I PHYS C P, V165, P106

[17] RELIABLE SINGLE-TARGET SPUTTERING PROCESS FOR HIGH-TEMPERATURE SUPERCONDUCTING FILMS AND DEVICES [J].

SANDSTROM, RL ;

GALLAGHER, WJ ;

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BUMBLE, B ;

CHISHOLM, MF .

APPLIED PHYSICS LETTERS, 1988, 53 (05) :444-446

[18] TARGET PRESPUTTERING EFFECTS ON STOICHIOMETRY AND DEPOSITION RATE OF Y-BA-CU-O THIN-FILMS GROWN BY DC MAGNETRON SPUTTERING [J].

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APPLIED PHYSICS LETTERS, 1988, 52 (22) :1907-1909

[19] SUPERCONDUCTIVITY AND RESPUTTERING EFFECTS IN RF-SPUTTERED YBA2CU3O7-X THIN-FILMS [J].

SHAH, SI ;

CARCIA, PF .

APPLIED PHYSICS LETTERS, 1987, 51 (25) :2146-2148

[20] SPUTTER SYNTHESIS OF BA2YCU3OY AS-DEPOSITED SUPERCONDUCTING THIN-FILMS FROM STOICHIOMETRIC TARGET - A MECHANISM OF COMPOSITIONAL DEVIATION AND ITS CONTROL [J].

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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1988, 27 (04) :L639-L642

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