CHARACTERIZATION OF VANADIUM-OXIDE OPTICAL THIN-FILMS BY X-RAY-DIFFRACTOMETRY

被引：6

作者：

CHAIN, EE ^{[1
]}

机构：

[1] LTV, MISSILES & ELECTR GRP, DIV MISSILES, DALLAS, TX 75265 USA

来源：

APPLIED OPTICS | 1989年 / 28卷 / 04期

关键词：

D O I：

10.1364/AO.28.000713

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：713 / 716

页数：4

共 13 条

[1] LOW-TEMPERATURE OXIDATION OF NONSTOICHIOMETRIC SPUTTER DEPOSITED VANADIUM PENTOXIDE [J].

AITA, CR ;

KAO, ML .

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[2] INFLUENCE OF ION-BEAM PARAMETERS ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF ION-ASSISTED REACTIVELY EVAPORATED VANADIUM DIOXIDE THIN-FILMS [J].

CASE, FC .

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[3] ALGEBRAIC-METHOD FOR EXTRACTING THIN-FILM OPTICAL-PARAMETERS FROM SPECTROPHOTOMETER MEASUREMENTS [J].

CASE, WE .

APPLIED OPTICS, 1983, 22 (12) :1832-1836

[4] EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF VANADIUM-OXIDE [J].

CHAIN, EE .

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[5] THE INFLUENCE OF DEPOSITION TEMPERATURE ON THE STRUCTURE AND OPTICAL-PROPERTIES OF VANADIUM-OXIDE FILMS [J].

CHAIN, EE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1986, 4 (03) :432-435

[6] SEEMAN-BOHLIN X-RAY DIFFRACTOMETER FOR THIN FILMS [J].

FEDER, R ;

BERRY, BS .

JOURNAL OF APPLIED CRYSTALLOGRAPHY, 1970, 3 (OCT1) :372-&

[7]

FITZPATRICK JJ, 1984, ADV XRAY ANAL, V27, P317

[8] THE DETERMINATION OF LATTICE-PARAMETERS AND STRAINS IN STRESSED THIN-FILMS USING X-RAY-DIFFRACTION WITH SEEMANN-BOHLIN FOCUSING [J].

HAASE, EL .

THIN SOLID FILMS, 1985, 124 (3-4) :283-291

[9] LOW-TEMPERATURE REACTIVE SPUTTER DEPOSITION OF VANADIUM-OXIDE [J].

HANSEN, SD ;

AITA, CR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (03) :660-663

[10]

MATYI RJ, 1986, ADV XRAY ANAL, V29, P375

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