INFLUENCE OF ION-BEAM PARAMETERS ON THE ELECTRICAL AND OPTICAL-PROPERTIES OF ION-ASSISTED REACTIVELY EVAPORATED VANADIUM DIOXIDE THIN-FILMS

被引：50

作者：

CASE, FC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574534

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1762 / 1766

页数：5

共 11 条

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[7] DEVELOPMENTS IN BROAD-BEAM ION-SOURCE TECHNOLOGY AND APPLICATIONS
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[8] GROWTH AND ELECTRICAL PROPERTIES OF VANADIUM DIOXIDE SINGLE CRYSTALS CONTAINING SELECTED IMPURITY IONS
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[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1969, 30 (02) : 225 - +
[9] PHASE TRANSITIONS AND CONDUCTIVITY ANOMALIES IN SOLID SOLUTIONS OF VO2 WITH TIO2, NBO2 AND MOO2
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[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1971, 32 (06) : 1147 - +
[10] DOPING OF VO2 THIN-FILMS BY ION-IMPLANTATION
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