SYNTHESIS OF SILICON-NITRIDE AND SILICON-OXIDE FILMS BY ION-ASSISTED DEPOSITION

被引：20

作者：

NETTERFIELD, RP

MARTIN, PJ

SAINTY, WG

机构：

来源：

APPLIED OPTICS | 1986年 / 25卷 / 21期

关键词：

D O I：

10.1364/AO.25.003808

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：3808 / 3809

页数：2

共 12 条

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[4]

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[5]

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NETTERFIELD, RP .

APPLIED OPTICS, 1984, 23 (16) :2668-2669

[7] RELATIONSHIPS BETWEEN STRESS, COMPOSITION, AND MICROSTRUCTURE IN SPUTTERED SILICON-NITRIDE [J].

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EXARHOS, GJ .

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[8] PREPARATION, CHARACTERIZATION AND APPLICATIONS OF SILICON-NITRIDE THIN-FILMS [J].

MOROSANU, CE .

THIN SOLID FILMS, 1980, 65 (02) :171-208

[9] CHARACTERIZATION OF GROWING THIN-FILMS BY INSITU ELLIPSOMETRY, SPECTRAL REFLECTANCE AND TRANSMITTANCE MEASUREMENTS, AND ION-SCATTERING SPECTROSCOPY [J].

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[10]

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