FLUORINE DISTRIBUTIONS IN A CHEMICAL VAPOR-DEPOSITED TUNGSTEN SILICIDE POLYCRYSTALLINE SILICON COMPOSITE GATE STRUCTURE

被引：17

作者：

FUKUMOTO, M

OHZONE, T

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 14期

关键词：

D O I：

10.1063/1.98025

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：894 / 896

页数：3

共 8 条

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