STRAIN, ION-BOMBARDMENT AND ENERGETIC NEUTRALS IN MAGNETRON SPUTTERING

被引：47

作者：

WINDOW, B

MULLER, KH

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(89)90043-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：183 / 196

页数：14

共 25 条

[21] PLASTIC-FLOW IN ION-ASSISTED DEPOSITION OF REFRACTORY-METALS [J].

WINDOW, B ;

SHARPLES, F ;

SAVVIDES, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2333-2340

[22] CHARGED-PARTICLE FLUXES FROM PLANAR MAGNETRON SPUTTERING SOURCES [J].

WINDOW, B ;

SAVVIDES, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (02) :196-202

[23] UNBALANCED DC MAGNETRONS AS SOURCES OF HIGH ION FLUXES [J].

WINDOW, B ;

SAVVIDES, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :453-456

[24]

WINDOW B, UNPUB J VAC SCI TECH

ZIEMANN, P ;

KAY, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :512-516