PHOTOCHEMICAL ETCHING DURING ULTRAVIOLET PHOTOLYTIC DEPOSITION OF METAL-FILMS ON SEMICONDUCTOR SURFACES

被引：3

作者：

KOWALCZYK, SP

MILLER, DL

机构：

[1] Rockwell Int Corp, Thousand Oaks,, CA, USA, Rockwell Int Corp, Thousand Oaks, CA, USA

来源：

关键词：

D O I：

10.1063/1.337043

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：287 / 289

页数：3

共 15 条

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[9] Kowalczyk S. P., UNPUB
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