PULSED MICROWAVE PLASMA-ETCHING OF POLYMERS IN OXYGEN AND NITROGEN FOR MICROELECTRONIC APPLICATIONS

被引：26

作者：

LIN, TH

BELSER, M

TZENG, YH

机构：

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1988年 / 16卷 / 06期

关键词：

D O I：

10.1109/27.16551

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

引用

页码：631 / 637

页数：7

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