PROPERTIES OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED DIELECTRIC FILMS FROM HEXAMETHYLDISILAZANE

被引：10

作者：

FREEMAN, D

KERN, W

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576300

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1446 / 1450

页数：5

共 12 条

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[6] GAS EVOLUTION STUDIES FOR STRUCTURAL CHARACTERIZATION OF HEXAMETHYLDISILAZANE-BASED A-SI-C-N-H FILMS [J].

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