DEPOSITION AND COMPOSITION OF SILICON OXYNITRIDE FILMS

被引：88

作者：

KUIPER, AET

KOO, SW

HABRAKEN, FHPM

TAMMINGA, Y

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 01期

关键词：

D O I：

10.1116/1.582543

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：62 / 66

页数：5

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