OXYNITRIDE DEPOSITION KINETICS IN A SIH4-CO2-NH3-H-2 SYSTEM

被引：24

作者：

GAIND, AK ^{[1
]}

ACKERMANN, GK ^{[1
]}

LUCARINI, VJ ^{[1
]}

BRATTER, RL ^{[1
]}

机构：

[1] IBM CORP, DIV SYST PROD, E FISHKILL FACIL, HOPEWELL JUNCTION, NY 12533 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1977年 / 124卷 / 04期

关键词：

D O I：

10.1149/1.2133357

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：599 / 606

页数：8

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