PROFILE CONTROL BY REACTIVE SPUTTER ETCHING

[11] PLASMA REACTOR DESIGN FOR SELECTIVE ETCHING OF SIO2 ON SI [J]. SOLID-STATE ELECTRONICS, 1976, 19 (12) : 1039 - 1040

[12] SOME CHARACTERISTICS AND USES OF LOW-PRESSURE PLASMAS IN MATERIALS SCIENCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 5 - 15

[13] Hosokawa N, 1974, JPN J APPL PHYS S, V13, P435

[14] COLOR PICTURES USING ZERO DIFFRACTION ORDER OF PHASE GRATING STRUCTURES [J]. OPTICS COMMUNICATIONS, 1976, 18 (03) : 298 - 303

[15] APPLICATION OF RF DISCHARGES TO SPUTTERING [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) : 168 - &

[16] REDEPOSITION - SERIOUS PROBLEM IN RF SPUTTER ETCHING OF STRUCTURES WITH MICRONMETER DIMENSIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 281 - 284

[17] LEHMANN HW, APPL PHYS LETT

[18] PREFERENTIAL SIO2 ETCHING ON SI SUBSTRATE BY PLASMA REACTIVE SPUTTER ETCHING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (01) : 175 - 176

[19] ION ETCHING FOR PATTERN DELINEATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05): : 1008 - 1022

[20] PECCOUD L, 1977, INT C MICROLITHOGRAP

[11] PLASMA REACTOR DESIGN FOR SELECTIVE ETCHING OF SIO2 ON SI [J]. SOLID-STATE ELECTRONICS, 1976, 19 (12) : 1039 - 1040

[12] SOME CHARACTERISTICS AND USES OF LOW-PRESSURE PLASMAS IN MATERIALS SCIENCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 5 - 15

[13] Hosokawa N, 1974, JPN J APPL PHYS S, V13, P435

[14] COLOR PICTURES USING ZERO DIFFRACTION ORDER OF PHASE GRATING STRUCTURES [J]. OPTICS COMMUNICATIONS, 1976, 18 (03) : 298 - 303

[15] APPLICATION OF RF DISCHARGES TO SPUTTERING [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) : 168 - &

[16] REDEPOSITION - SERIOUS PROBLEM IN RF SPUTTER ETCHING OF STRUCTURES WITH MICRONMETER DIMENSIONS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 281 - 284

[17] LEHMANN HW, APPL PHYS LETT

[18] PREFERENTIAL SIO2 ETCHING ON SI SUBSTRATE BY PLASMA REACTIVE SPUTTER ETCHING [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (01) : 175 - 176

[19] ION ETCHING FOR PATTERN DELINEATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (05): : 1008 - 1022

[20] PECCOUD L, 1977, INT C MICROLITHOGRAP