X-RAY TOPOGRAPHIC AND X-RAY MICROANALYTICAL STUDIES ON DIFFUSION OF GOLD IN SILICON

被引：6

作者：

BRUMMER, O

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1971年 / 5卷 / 01期

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D O I：

10.1002/pssa.2210050122

中图分类号：

T [工业技术];

学科分类号：

08 ;

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页码：199 / &

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