OXIDE-FREE ETCHING OF (100)INP SURFACES

被引：7

作者：

KNAUER, A ^{[1
]}

HIRSCH, D ^{[1
]}

STASKE, R ^{[1
]}

ZEIMER, U ^{[1
]}

机构：

[1] ACAD SCI GDR,ZENT INST ISOTOPEN & STRAHLENFORSCH,DDR-7050 LEIPZIG,GER DEM REP

来源：

CRYSTAL RESEARCH AND TECHNOLOGY | 1989年 / 24卷 / 04期

关键词：

D O I：

10.1002/crat.2170240422

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：443 / 451

页数：9

共 23 条

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