ELECTRICAL CHARACTERIZATION OF INSITU FABRICATED N+-SI/GAAS INTERFACES

被引:3
作者
ARAI, K
MIZUTANI, T
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.584774
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:497 / 501
页数:5
相关论文
共 18 条
[1]  
ARAI K, 1986, I PHYS C SER, V79, P631
[2]  
ASANO T, 1987, 19TH C SOL STAT DEV, P67
[3]   FERMI LEVEL PINNING AND CHEMICAL INTERACTIONS AT METAL-INXGA1-XAS(100) INTERFACES [J].
BRILLSON, LJ ;
SLADE, ML ;
VITURRO, RE ;
KELLY, MK ;
TACHE, N ;
MARGARITONDO, G ;
WOODALL, JM ;
KIRCHNER, PD ;
PETTIT, GD ;
WRIGHT, SL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (04) :919-923
[4]   SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR BARRIERS [J].
CHANG, CY ;
FANG, YK ;
SZE, SM .
SOLID-STATE ELECTRONICS, 1971, 14 (07) :541-&
[5]   INDEPENDENCE OF FERMI-LEVEL POSITION AND VALENCE-BAND EDGE DISCONTINUITY AT GAAS-GE(100) INTERFACES [J].
CHIARADIA, P ;
KATNANI, AD ;
SANG, HW ;
BAUER, RS .
PHYSICAL REVIEW LETTERS, 1984, 52 (14) :1246-1249
[6]  
GLANG R, 1970, HDB THIN FILM TECHNO, P1
[7]   VARIATION OF N-GAAS (100) INTERFACE FERMI LEVEL BY GE AND SI OVERLAYERS [J].
GRANT, RW ;
WALDROP, JR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (04) :1015-1019
[8]   MICROSCOPIC STUDY OF SEMICONDUCTOR HETEROJUNCTIONS - PHOTOEMISSION MEASUREMENT OF THE VALANCE-BAND DISCONTINUITY AND OF THE POTENTIAL BARRIERS [J].
KATNANI, AD ;
MARGARITONDO, G .
PHYSICAL REVIEW B, 1983, 28 (04) :1944-1956
[9]   THE POLYCRYSTALLINE-SI CONTACT TO GAAS [J].
KAVANAGH, KL ;
MAYER, JW ;
MAGEE, CW ;
SHEETS, J ;
TONG, J ;
KIRCHNER, PD ;
WOODALL, JM ;
HALLER, I .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1986, 133 (06) :1176-1179
[10]   THE SI/GAAS (110) HETEROJUNCTION - STRAIN, DISORDER, AND VALENCE-BAND DISCONTINUITY [J].
LIST, RS ;
WOICIK, JC ;
LINDAU, I ;
SPICER, WE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (04) :1279-1283