PROCESS-CONTROL FOR THE LOW-TEMPERATURE DEPOSITION OF NIOBIUM-NITRIDE THIN-FILMS

被引：13

作者：

ANDERSON, AC

LICHTENWALNER, DJ

BROGAN, WT

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1989年 / 25卷 / 02期

关键词：

D O I：

10.1109/20.92718

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2084 / 2088

页数：5

共 13 条

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[2]

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[5]

CUKAUSKAS EJ, 1986, ADV CRYOGEN ENG, V32, P643

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DEEN, MJ .

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[7] AN INTEGRATION OF ALL REFRACTORY JOSEPHSON LOGIC LSI CIRCUIT [J].

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IEEE TRANSACTIONS ON MAGNETICS, 1985, 21 (02) :102-109

[8] NBN/BN ANTIGRANULOCYTES FILMS - A NOVEL BROAD-BAND BOLOMETRIC DETECTOR FOR PULSED FAR INFRARED RADIATION [J].

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WOLF, SA ;

SIMON, RW .

IEEE TRANSACTIONS ON MAGNETICS, 1987, 23 (02) :714-716

[9] THE DEPENDENCE OF DEPOSITION RATE ON POWER INPUT FOR DC AND RF MAGNETRON SPUTTERING [J].

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HOLLAND, L .

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[10] LANGMUIR PROBE CHARACTERIZATION OF MAGNETRON OPERATION [J].

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KAUFMAN, HR .

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