ANALYSIS OF REACTIVE SPUTTERING MECHANISMS FOR NBN FILM DEPOSITION

被引：17

作者：

BHUSHAN, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.574316

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：2829 / 2835

页数：7

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