共 12 条
- [1] RESIST HEATING EFFECT IN DIRECT ELECTRON-BEAM WRITING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (03): : 853 - 857
- [2] THERMAL DISTRIBUTION AND THE EFFECT ON RESIST SENSITIVITY IN ELECTRON-BEAM DIRECT WRITE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1502 - 1506
- [3] 3-DIMENSIONAL MONTE-CARLO CALCULATION BY A SUPERCOMPUTER [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 142 - 145
- [4] THERMAL EFFECTS IN ELECTRON-BEAM LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1552 - 1555
- [5] THE EFFECT OF ACCELERATION VOLTAGE ON LINEWIDTH CONTROL WITH A VARIABLE-SHAPED ELECTRON-BEAM SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 105 - 109
- [6] Murai F., 1989, Proceedings of the SPIE - The International Society for Optical Engineering, V1089, P367, DOI 10.1117/12.968545
- [7] NAKAJIMA K, 1990, J VAC SCI TECHNOL B, V8, P1440
- [8] RALF HK, 1982, 10TH INT C EL ION BE, P219
- [9] CRITERION TO JUDGE WHETHER THE RESIST HEATING EFFECT WILL OCCUR [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3464 - 3469
- [10] SUZUKI K, 1983, JPN J APPL PHYS S, V22, P175