DEFINED ETCHING OF CARBON-DIAMOND FILMS ON SILICON USING AN OXYGEN PLASMA WITH TITANIUM MASKING

被引:12
作者
CHAN, KK [1 ]
AMARATUNGA, GAJ [1 ]
WONG, TKS [1 ]
机构
[1] UNIV CAMBRIDGE, DEPT ENGN, CAMBRIDGE CB2 1PZ, ENGLAND
关键词
D O I
10.1016/0925-9635(92)90040-U
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A technique for pattern transfer onto carbon-diamond films deposited by radio-frequency plasma-enhanced chemical vapour deposition is reported. Such a technique involves standard photolithography processes and reactive ion etching by oxygen and is compatible with present day microelectronic technology. The patterns transferred are well defined with very good resolution. © 1992.
引用
收藏
页码:281 / 284
页数:4
相关论文
共 13 条
  • [1] CRYSTALLINE DIAMOND GROWTH IN THIN-FILMS DEPOSITED FROM A CH4-AR RF PLASMA
    AMARATUNGA, G
    PUTNIS, A
    CLAY, K
    MILNE, W
    [J]. APPLIED PHYSICS LETTERS, 1989, 55 (07) : 634 - 635
  • [2] SYNTHETIC DIAMOND MICROMECHANICAL MEMBRANES, CANTILEVER BEAMS, AND BRIDGES
    DAVIDSON, JL
    RAMESHAM, R
    ELLIS, C
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (10) : 3206 - 3210
  • [3] MICROSTRUCTURAL CONTROL OF DIAMOND THIN-FILMS BY MICROLITHOGRAPHIC PATTERNING
    DENATALE, JF
    FLINTOFF, JF
    HARKER, AB
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 68 (08) : 4014 - 4019
  • [4] SELECTIVE DEPOSITION OF DIAMOND CRYSTALS BY CHEMICAL VAPOR-DEPOSITION USING A TUNGSTEN-FILAMENT METHOD
    HIRABAYASHI, K
    TANIGUCHI, Y
    TAKAMATSU, O
    IKEDA, T
    IKOMA, K
    IWASAKIKURIHARA, N
    [J]. APPLIED PHYSICS LETTERS, 1988, 53 (19) : 1815 - 1817
  • [5] SELECTED-AREA DEPOSITION OF DIAMOND FILMS
    INOUE, T
    TACHIBANA, H
    KUMAGAI, K
    MIYATA, K
    NISHIMURA, K
    KOBASHI, K
    NAKAUE, A
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (12) : 7329 - 7336
  • [6] SELECTIVE NUCLEATION AND GROWTH OF DIAMOND PARTICLES BY PLASMA-ASSISTED CHEMICAL VAPOR-DEPOSITION
    MA, JS
    KAWARADA, H
    YONEHARA, T
    SUZUKI, J
    WEI, J
    YOKOTA, Y
    HIRAKI, A
    [J]. APPLIED PHYSICS LETTERS, 1989, 55 (11) : 1071 - 1073
  • [7] Maissel LI, 1970, HDB THIN FILM TECHNO
  • [8] MCQUILLAN AD, 1956, TITANIUM, P246
  • [9] MOHRI T, 1984, J APPL PHYS, V55, P3276
  • [10] LARGE GRAIN-SIZE THIN-FILMS OF CARBON WITH DIAMOND STRUCTURE
    NAMBA, Y
    WEI, J
    MOHRI, T
    HEIDARPOUR, EA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (01): : 36 - 39