RECENT TRENDS IN SURFACE-TREATMENT USING ION-BEAM PROCESSES

被引：9

作者：

COLLIGON, JS

机构：

来源：

VACUUM | 1987年 / 37卷 / 1-2期

关键词：

D O I：

10.1016/0042-207X(87)90080-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：35 / 39

页数：5

共 56 条

[21]

HENDERSON E, 1977, 1977 P C ION PLAT AL, P122

[22]

HUBLER GK, 1984, ION IMPLANTATION ION, V27

[23]

KHEYRANDISH H, 1984, MATER RES SOC S P, V27, P513

[24] MORPHOLOGY OF ION-PLATED TITANIUM AND ALUMINUM FILMS DEPOSITED AT VARIOUS SUBSTRATE TEMPERATURES [J].

LARDON, M ;

BUHL, R ;

SIGNER, H ;

PULKER, HK ;

MOLL, E .

THIN SOLID FILMS, 1978, 54 (03) :317-322

[25]

LEUTENECKER R, 1985, SURFACE MODIFICATION, P465

[26] RANGES OF ENERGETIC IONS IN MATTER [J].

LITTMARK, U ;

ZIEGLER, JF .

PHYSICAL REVIEW A, 1981, 23 (01) :64-72

[27] THE PREPARATION AND CHARACTERIZATION OF OPTICAL THIN-FILMS PRODUCED BY ION-ASSISTED DEPOSITION [J].

MARTIN, PJ ;

NETTERFIELD, RP ;

SAINTY, WG ;

PACEY, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1984, 2 (02) :341-345

[28] ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS [J].

MARTIN, PJ ;

NETTERFIELD, RP ;

SAINTY, WG ;

CLARK, GJ ;

LANFORD, WA ;

SIE, SH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :711-713

[29] INTERFACE FORMATION DURING THIN FILM DEPOSITION [J].

MATTOX, DM ;

MCDONALD, JE .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (08) :2493-&

[30] STRUCTURE MODIFICATION BY ION-BOMBARDMENT DURING DEPOSITION [J].

MATTOX, DM ;

KOMINIAK, GJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :528-&

← 1 2 3 4 5 6 →