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ZINC-DOPING OF (511)A LAYERS OF (AL0.6GA0.4)0.5IN0.5P GROWN BY ATMOSPHERIC METALORGANIC VAPOR-PHASE EPITAXY
被引:21
作者
:
MINAGAWA, S
论文数:
0
引用数:
0
h-index:
0
MINAGAWA, S
KONDOW, M
论文数:
0
引用数:
0
h-index:
0
KONDOW, M
机构
:
来源
:
ELECTRONICS LETTERS
|
1989年
/ 25卷
/ 06期
关键词
:
D O I
:
10.1049/el:19890284
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:413 / 414
页数:2
相关论文
共 7 条
[1]
STUDIES OF GAXIN1-XP LAYERS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY - EFFECTS OF V/III RATIO AND GROWTH TEMPERATURE
GOMYO, A
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
GOMYO, A
KOBAYASHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
KOBAYASHI, K
KAWATA, S
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
KAWATA, S
HINO, I
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
HINO, I
SUZUKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
SUZUKI, T
YUASA, T
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
YUASA, T
[J].
JOURNAL OF CRYSTAL GROWTH,
1986,
77
(1-3)
: 367
-
373
[2]
HINO I, 1986, I PHYS C SER, V79, P151
[3]
GAINP/ALGAINP DOUBLE-HETEROSTRUCTURE LASER GROWN ON A (111)B-ORIENTED GAAS SUBSTRATE BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
IKEDA, M
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
IKEDA, M
MORITA, E
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
MORITA, E
TODA, A
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
TODA, A
YAMAMOTO, T
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
YAMAMOTO, T
KANEKO, K
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
KANEKO, K
[J].
ELECTRONICS LETTERS,
1988,
24
(17)
: 1094
-
1095
[4]
CRYSTALLINE AND ELECTRONIC-ENERGY STRUCTURE OF OMVPE-GROWN ALGAINP/GAAS
KONDOW, M
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
KONDOW, M
KAKIBAYASHI, H
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
KAKIBAYASHI, H
MINAGAWA, S
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
MINAGAWA, S
INOUE, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
INOUE, Y
NISHINO, T
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
NISHINO, T
HAMAKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
HAMAKAWA, Y
[J].
JOURNAL OF CRYSTAL GROWTH,
1988,
93
(1-4)
: 412
-
417
[5]
ZN DOPING CHARACTERISTICS FOR INGAALP GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
NISHIKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
NISHIKAWA, Y
TSUBURAI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TSUBURAI, Y
NOZAKI, C
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
NOZAKI, C
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
OHBA, Y
KOKUBUN, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
KOKUBUN, Y
KINOSHITA, H
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
KINOSHITA, H
[J].
APPLIED PHYSICS LETTERS,
1988,
53
(22)
: 2182
-
2184
[6]
A STUDY OF P-TYPE DOPING FOR ALGAINP GROWN BY LOW-PRESSURE MOCVD
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
OHBA, Y
NISHIKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
NISHIKAWA, Y
NOZAKI, C
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
NOZAKI, C
SUGAWARA, H
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
SUGAWARA, H
NAKANISI, T
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
NAKANISI, T
[J].
JOURNAL OF CRYSTAL GROWTH,
1988,
93
(1-4)
: 613
-
617
[7]
GROWTH OF HIGH-QUALITY INGAALP EPILAYERS BY MOCVD USING METHYL METALORGANICS AND THEIR APPLICATION TO VISIBLE SEMICONDUCTOR-LASERS
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
OHBA, Y
ISHIKAWA, M
论文数:
0
引用数:
0
h-index:
0
ISHIKAWA, M
SUGAWARA, H
论文数:
0
引用数:
0
h-index:
0
SUGAWARA, H
YAMAMOTO, M
论文数:
0
引用数:
0
h-index:
0
YAMAMOTO, M
NAKANISI, T
论文数:
0
引用数:
0
h-index:
0
NAKANISI, T
[J].
JOURNAL OF CRYSTAL GROWTH,
1986,
77
(1-3)
: 374
-
379
←
1
→
共 7 条
[1]
STUDIES OF GAXIN1-XP LAYERS GROWN BY METALORGANIC VAPOR-PHASE EPITAXY - EFFECTS OF V/III RATIO AND GROWTH TEMPERATURE
GOMYO, A
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
GOMYO, A
KOBAYASHI, K
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
KOBAYASHI, K
KAWATA, S
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
KAWATA, S
HINO, I
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
HINO, I
SUZUKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
SUZUKI, T
YUASA, T
论文数:
0
引用数:
0
h-index:
0
机构:
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
OPTOELECTR JOINT RES LAB,NAKAHARA KU,KAWASAKI 211,JAPAN
YUASA, T
[J].
JOURNAL OF CRYSTAL GROWTH,
1986,
77
(1-3)
: 367
-
373
[2]
HINO I, 1986, I PHYS C SER, V79, P151
[3]
GAINP/ALGAINP DOUBLE-HETEROSTRUCTURE LASER GROWN ON A (111)B-ORIENTED GAAS SUBSTRATE BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
IKEDA, M
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
IKEDA, M
MORITA, E
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
MORITA, E
TODA, A
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
TODA, A
YAMAMOTO, T
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
YAMAMOTO, T
KANEKO, K
论文数:
0
引用数:
0
h-index:
0
机构:
Sony Corp, Japan
KANEKO, K
[J].
ELECTRONICS LETTERS,
1988,
24
(17)
: 1094
-
1095
[4]
CRYSTALLINE AND ELECTRONIC-ENERGY STRUCTURE OF OMVPE-GROWN ALGAINP/GAAS
KONDOW, M
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
KONDOW, M
KAKIBAYASHI, H
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
KAKIBAYASHI, H
MINAGAWA, S
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
MINAGAWA, S
INOUE, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
INOUE, Y
NISHINO, T
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
NISHINO, T
HAMAKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
HAMAKAWA, Y
[J].
JOURNAL OF CRYSTAL GROWTH,
1988,
93
(1-4)
: 412
-
417
[5]
ZN DOPING CHARACTERISTICS FOR INGAALP GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL VAPOR-DEPOSITION
NISHIKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
NISHIKAWA, Y
TSUBURAI, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TSUBURAI, Y
NOZAKI, C
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
NOZAKI, C
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
OHBA, Y
KOKUBUN, Y
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
KOKUBUN, Y
KINOSHITA, H
论文数:
0
引用数:
0
h-index:
0
机构:
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
TOSHIBA CORP,DIV SEMICOND,SAIWAI KU,KAWASAKI 210,JAPAN
KINOSHITA, H
[J].
APPLIED PHYSICS LETTERS,
1988,
53
(22)
: 2182
-
2184
[6]
A STUDY OF P-TYPE DOPING FOR ALGAINP GROWN BY LOW-PRESSURE MOCVD
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
OHBA, Y
NISHIKAWA, Y
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
NISHIKAWA, Y
NOZAKI, C
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
NOZAKI, C
SUGAWARA, H
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
SUGAWARA, H
NAKANISI, T
论文数:
0
引用数:
0
h-index:
0
机构:
Toshiba Corp, Japan
NAKANISI, T
[J].
JOURNAL OF CRYSTAL GROWTH,
1988,
93
(1-4)
: 613
-
617
[7]
GROWTH OF HIGH-QUALITY INGAALP EPILAYERS BY MOCVD USING METHYL METALORGANICS AND THEIR APPLICATION TO VISIBLE SEMICONDUCTOR-LASERS
OHBA, Y
论文数:
0
引用数:
0
h-index:
0
OHBA, Y
ISHIKAWA, M
论文数:
0
引用数:
0
h-index:
0
ISHIKAWA, M
SUGAWARA, H
论文数:
0
引用数:
0
h-index:
0
SUGAWARA, H
YAMAMOTO, M
论文数:
0
引用数:
0
h-index:
0
YAMAMOTO, M
NAKANISI, T
论文数:
0
引用数:
0
h-index:
0
NAKANISI, T
[J].
JOURNAL OF CRYSTAL GROWTH,
1986,
77
(1-3)
: 374
-
379
←
1
→