CRYSTALLIZATION OF AMORPHOUS TI-SI ALLOY THIN-FILMS - MICROSTRUCTURE AND RESISTIVITY

被引：24

作者：

RAAIJMAKERS, IJMM

VANOMMEN, AH

READER, AH

机构：

来源：

关键词：

D O I：

10.1063/1.343353

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3896 / 3906

页数：11

共 48 条

[31] NICOLET MA, 1983, VLSI ELECTRONICS, V6
[32] NOWOTNY H, 1954, PLANSEEBER PULVERMET, V2, P34
[33] RAAIJMAKERS IJM, 1988, THESIS EINDHOVEN U T
[34] RAAIJMAKERS IJMM, 1987, VIDE, V42, P75
[35] NUCLEATION AND GROWTH OF TITANIUM SILICIDE STUDIED BY INSITU ANNEALING IN A TRANSMISSION ELECTRON-MICROSCOPE
RAAIJMAKERS, IJMM
READER, AH
VANHOUTUM, HJW
[J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (07) : 2527 - 2532
[36] READER AH, 1987, MATER RES SOC S P, V92, P177
[37] READER AH, 1987, I PHYS C SER, V87, P523
[38] ELECTRICAL AND STRUCTURAL-PROPERTIES OF ION-IMPLANTED AND POST-ANNEALED SILICIDE FILMS
SORIMACHI, Y
ISHIWARA, H
YAMAMOTO, H
FURUKAWA, S
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (05): : 752 - 756
[39] EFFECT OF A SUBSTRATE ON THE PHASE-TRANSFORMATIONS OF AMORPHOUS TISI2 THIN-FILMS
THOMPSON, RD
TAKAI, H
PSARAS, PA
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1987, 61 (02) : 540 - 544
[40] TEMPERATURE-DEPENDENCE OF STRUCTURAL AND ELECTRICAL-PROPERTIES OF TA-SI THIN ALLOY-FILMS
TIEN, T
OTTAVIANI, G
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) : 7047 - 7057