EFFECT OF CO ON THE LOW-TEMPERATURE DIFFUSION OF CR AND SI THROUGH THIN GOLD-FILMS

[1] Baglin J. E. E., 1978, Thin films. Interdiffusion and reactions, P305

[2] ENHANCED CRYSTALLINITY OF LOW-TEMPERATURE-DEPOSITED SILICON FILMS ON GRAPHITE SUBSTRATES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (03) : 208 - 210

[3] ENHANCED CRYSTALLINITY OF SILICON FILM DEPOSITED AT LOW-TEMPERATURE [J]. APPLIED PHYSICS LETTERS, 1975, 26 (04) : 178 - 180

[4] CHOPRA KL, 1969, THIN FILM PHENOMENA, P380

[5] CHARGE PENETRATION INTO A CONDUCTOR IN EQUILIBRIUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1959, 73 (474): : 869 - 872

[6] LOW-TEMPERATURE MIGRATION OF SILICON THROUGH METAL FILMS IMPORTANCE OF SILICON-METAL INTERFACE [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1971, 7 (02): : 401 - &

[7] FORMATION OF SILICON OXIDE OVER GOLD LAYERS ON SILICON SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (09) : 3643 - &

[8] EFFECT OF SURFACE CONDITION ON DIFFUSION IN THIN-FILMS AT LOW-TEMPERATURES [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 458 - 461

[9] KANG KD, 1969, IEEE T ELECTRON DEV, VED16, P356, DOI 10.1109/T-ED.1969.16757

[10] NELSON GC, 1976, STP596 ASTM AM SOC T, P68

[1] Baglin J. E. E., 1978, Thin films. Interdiffusion and reactions, P305

[2] ENHANCED CRYSTALLINITY OF LOW-TEMPERATURE-DEPOSITED SILICON FILMS ON GRAPHITE SUBSTRATES [J]. APPLIED PHYSICS LETTERS, 1976, 29 (03) : 208 - 210

[3] ENHANCED CRYSTALLINITY OF SILICON FILM DEPOSITED AT LOW-TEMPERATURE [J]. APPLIED PHYSICS LETTERS, 1975, 26 (04) : 178 - 180

[4] CHOPRA KL, 1969, THIN FILM PHENOMENA, P380

[5] CHARGE PENETRATION INTO A CONDUCTOR IN EQUILIBRIUM [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON, 1959, 73 (474): : 869 - 872

[6] LOW-TEMPERATURE MIGRATION OF SILICON THROUGH METAL FILMS IMPORTANCE OF SILICON-METAL INTERFACE [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1971, 7 (02): : 401 - &

[7] FORMATION OF SILICON OXIDE OVER GOLD LAYERS ON SILICON SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (09) : 3643 - &

[8] EFFECT OF SURFACE CONDITION ON DIFFUSION IN THIN-FILMS AT LOW-TEMPERATURES [J]. APPLIED PHYSICS LETTERS, 1978, 33 (05) : 458 - 461

[9] KANG KD, 1969, IEEE T ELECTRON DEV, VED16, P356, DOI 10.1109/T-ED.1969.16757

[10] NELSON GC, 1976, STP596 ASTM AM SOC T, P68