A FRAMEWORK FOR UNDERSTANDING RADIATION-INDUCED INTERFACE STATES IN SIO2 MOS STRUCTURES

被引:493
作者
MCLEAN, FB
机构
关键词
D O I
10.1109/TNS.1980.4331084
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1651 / 1657
页数:7
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