HIGHLY RELIABLE TEMPERATURE SENSOR USING RF-SPUTTERED SIC THIN-FILM

被引:33
作者
WASA, K
TOHDA, T
KASAHARA, Y
HAYAKAWA, S
机构
[1] Materials Research Laboratory, Matsushita Electric Industrial Co. Ltd., Moriguchi, Osaka
关键词
D O I
10.1063/1.1135988
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A SiC thin-film thermistor for high-temperature use has been developed by using rf-sputtered SiC thin films. This thermistor can be used for industrial and consumer use within an operating temperature range of -100 to 450°C. By using SiC thin films, the thermistor maintains high electrical stability. The resistance change is less than 3% after exposure to heat at 400°C for 2000 h. In addition, the film growth technique made possible the production of a high-accuracy thermistor, i.e., thermistor coefficient <±0.5%, thermistor resistance <±1.5%.
引用
收藏
页码:1084 / 1088
页数:5
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